منابع مشابه
Nonlinear optical properties of photoresists for projection lithography
Optical beams are self-focused and self-trapped upon initiating crosslinking in photoresists. This nonlinear optical phenomenon is apparent only for low average optical intensities and produces index of refraction changes as large as 0.04. We propose using the self-focusing and self-trapping phenomenon in projection photolithography to enhance the resolution and depth of focus. © 1996 American ...
متن کاملPossibilities for projection x-ray lithography using holographic optical elements.
The use of a single flat grazing incidence reflector on which a computer-generated hologram has been written is proposed for projection x-ray lithography.
متن کاملDeep-UV microsphere projection lithography.
In this Letter, we present a single-exposure deep-UV projection lithography at 254-nm wavelength that produces nanopatterns in a scalable area with a feature size of 80 nm. In this method, a macroscopic lens projects a pixelated optical mask on a monolayer of hexagonally arranged microspheres that reside on the Fourier plane and image the mask's pattern into a photoresist film. Our macroscopic ...
متن کاملSoft-x-ray projection lithography
Soft-x-ray projection imaging is demonstrated by the use of 14-nm radiation from a laser plasma source and a single-surface multilayer-coated ellipsoidal condenser. Aberrations in the condenser and the Schwarzschild imaging objective are characterized and correlated with imaging performance. A new Schwarzschild housing, designed for improved alignment stability, is described.
متن کاملEUV Lithography—The Successor to Optical Lithography?
This paper discusses the basic concepts and current state of development of EUV lithography (EUVL), a relatively new form of lithography that uses extreme ultraviolet (EUV) radiation with a wavelength in the range of 10 to 14 nanometer (nm) to carry out projection imaging. Currently, and for the last several decades, optical projection lithography has been the lithographic technique used in the...
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ژورنال
عنوان ژورنال: Materials Today
سال: 2005
ISSN: 1369-7021
DOI: 10.1016/s1369-7021(05)00698-x